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Extends lithography at SPIE Advanced Lithography
February 20, 2014
By: DAVID SAVASTANO
Brewer Science shared its latest cutting-edge advancements in lithography technology, materials, and process solutions at SPIE Advanced Lithography, Feb. 23-27, 2014. SPIE, the conference’s sponsor, is the international society for optics and photonics. Brewer Science has developed cutting-edge materials and processes for controlling light during photolithography processes for over three decades. Advances in the company’s materials including ARC anti-reflective coatings have helped make electronics smaller, faster, and more affordable.
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